Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Piliptsov, D.G. | - |
| dc.contributor.author | Rogachev, A.V. | - |
| dc.contributor.author | Rudenkov, A.S. | - |
| dc.contributor.author | Xiaohong Jiang | - |
| dc.contributor.author | Bing Zhou | - |
| dc.contributor.author | Пилипцов, Д.Г. | - |
| dc.contributor.author | Рогачев, А.В. | - |
| dc.contributor.author | Руденков, А.С. | - |
| dc.date.accessioned | 2019-05-16T13:23:59Z | - |
| dc.date.available | 2019-05-16T13:23:59Z | - |
| dc.date.issued | 2018 | - |
| dc.identifier.citation | Physical and chemical regularities of the structure and properties of doped carbon films deposited from the plasma of pulsed cathode-arc discharge / D.G. Piliptsov, A.V. Rogachev, A.S. Rudenkov, Xiaohong Jiang, Bing Zhou // Белорусско-китайский научно-технический семинар : материалы (Гомель, 11―13 июня 2018 года) / [редколлегия: А. В. Рогачев (главный редактор), А. Л. Самофалов, А. С. Руденков]. — Гомель : ГГУ, 2018. — C. 13-17. | ru |
| dc.identifier.uri | http://elib.gsu.by/handle/123456789/6654 | - |
| dc.language.iso | Английский | ru |
| dc.title | Physical and chemical regularities of the structure and properties of doped carbon films deposited from the plasma of pulsed cathode-arc discharge | ru |
| dc.type | Article | ru |
| dc.root | Белорусско-китайский научно-технический семинар | ru |
| Appears in Collections: | Статьи | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Physical and chemical regularities.pdf | 244.02 kB | Adobe PDF | View/Open |
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