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dc.contributor.authorShalupaev, S.V.-
dc.contributor.authorSerdyukov, A.N.-
dc.contributor.authorMityurich, G.S.-
dc.contributor.authorAleksiejuk, M.-
dc.contributor.authorNikitjuk, Y.V.-
dc.contributor.authorSereda, A.A.-
dc.contributor.authorШалупаев, С.В.-
dc.contributor.authorСердюков, А.Н.-
dc.contributor.authorМитюрич, Г.С.-
dc.contributor.authorАлексиюк, М.-
dc.contributor.authorНикитюк, Ю.И.-
dc.contributor.authorСереда, А.А.-
dc.date.accessioned2019-10-07T13:28:44Z-
dc.date.available2019-10-07T13:28:44Z-
dc.date.issued2013-
dc.identifier.citationModeling of mechanical influence of double-beam laser on single-crystalline silicon / S.V. Shalupaev, A.N. Serdyukov, G.S. Mityurich, M. Aleksiejuk, Y.V. Nikitjuk, A.A. Sereda // Archives of Мetallurgy and Мaterials. - 2013. - Vol. 58, № 4. - Р. 1381-1385.ru
dc.identifier.issn1733-3490-
dc.identifier.urihttp://elib.gsu.by/handle/123456789/7417-
dc.description.abstractThe results of finite-element modeling of controlled laser thermosplitting of crystalline silicon are presented. The case of treatment by two laser beam with wavelengths, namely 0.808 m and 1.06 m is studied. Calculations of the thermoelastic fields formed in a single-crystalline silicon wafer as a result of consecutive two-beam laser heating and action of coolant were performed for silicon crystalline orientations: (100), (110), (111). Modeling was performed for circular and U-shaped laser beams. The results received in the presented work, can be used for the process optimization concerning the precise separation of silicon wafers by laser cutting.ru
dc.language.isoАнглийскийru
dc.subjectlaser cuttingru
dc.subjectthermoelastic stressesru
dc.subjectsilicon wafersru
dc.subjectcrackru
dc.titleModeling of mechanical influence of double-beam laser on single-crystalline siliconru
dc.typeArticleru
dc.rootArchives of Мetallurgy and Мaterialsru
dc.number№ 4ru
dc.volume58ru
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