Applying multi-objective genetic algorithm (MOGA) to optimize synthesis parameters of dielectric Sol-Gel coatings for microelectronics

Abstract

This study optimized the parameters of silicon dioxide coating formation using a genetic algorithm. The coatings were prepared via the sol-gel method. Experiments were conducted using a facecentered central composite design, with the following input parameters: the ratio of silicon organic compounds in the initial sol, spin-coating rotation speed, and annealing temperature. The output characteristics included coating thickness, refractive index, and leakage currents of the sol-gel coatings. The influence of coating formation parameters on these characteristics was evaluated. The coating process optimization was performed using a genetic algorithm with the objective of minimizing leakage currents for sol-gel coatings of specified thickness.